Photolithography is the primary means of transferring complex microscopic patterns onto substrates in the manufacture of many types of micro-fabricated devices. The photoresist sensitive to UV light is spin-coated onto the wafer and exposed to UV light through the mask in order to achieve the desired pattern. Subsequent deposition, etching and further lithographic processing is used to complete the device.
We are equipped with Karl Suss Mask Aligner (MA55) for lithographic processing. This aligner exposes wafers up to 4" in diameter with ultraviolet light which includes I, G, and H lines. MA55 can achieve a resolution of 2 μm.